High Conductivity Film Lab Vacuum Furnace For PI Film Graphitization Production
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High Conductivity Film Lab Vacuum Furnace For PI Film Graphitization Production
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Features
Basic Infomation
Place of Origin: CHINA
Brand Name: OEM
Certification: CE Certification
Model Number: OEM
High Light:

high temperature vacuum furnace

,

vacuum brazing furnace

Payment & Shipping Terms
Packaging Details: Carton, pallet, wooden case or according to customer's package requirements
Delivery Time: 30 working days
Payment Terms: 30% deposit + 70% T/T before shipping
Supply Ability: 20 sets per month
Specifications
Name: Graphitization Furnace
Maximum Operating Temperature: 3000℃
Common Temperature: 2800℃
Temperature Uniformity: ≤ ± 25 ° C
Temperature Control Accuracy: ±1 °C
Product Description

High Conductivity Film Graphitization Furnace For PI Film Graphitization Production

 

 

Application:


It is applied to the graphitization production of high thermal conductivity film (PI film).


Features:


The temperature uniformity of the furnace body: the medium frequency induction heating, fast heating, high efficiency, unique furnace design, greatly improving the temperature uniformity of the furnace;
Low energy consumption and good stability: the world's first use of double-layer alumina brick insulation material to prevent carbon felt and coil short circuit, good heat insulation and fire resistance, low heat loss and good equipment stability;
According to the needs of the sintering process time, a plurality of electric furnaces can be arranged in a single power supply, and the plurality of furnaces are respectively energized to raise temperature and power off and cool down to realize continuous operation;
Digital flow monitoring system, water flow monitoring and protection of each power supply cabinet, high-performance intermediate frequency contactor for furnace conversion; comprehensive PLC water, electricity and gas automatic control and protection system.
The main technical parameters:
Maximum operating temperature: 3000 ° C
Common temperature: 2800 ° C
Working atmosphere in the furnace: vacuum, hydrogen, nitrogen, inert gas, etc.
Temperature uniformity: ≤ ± 25 ° C
Temperature measurement: far infrared optical temperature measurement (1000-3200 ° C);
Temperature measurement accuracy: 0.2 to 0.75%
Temperature control: program control and manual control; temperature control accuracy: ±1 °C

 

Product Model Specification  
Volume (L) 282
Rated Temperature (°C) 2800
Limit Temperature (°C) 3000
Effective Heating Zone (Mm) Φ600X1000
Power (KW) 300
Frequency (HZ) 1000
Temperature Control Method Japanese island electric thermostat
Heating Method Induction heating
Vacuum System Rotary vane vacuum pump (high vacuum requirement with Roots vacuum pump)
Sintering Atmosphere N2, Ar2 and other gases
Rated Power Supply Voltage (V) 380
Rated Heating Voltage (V) 750
Vacuum Limit (Pa) 100 (vacuum cold state)

 

 

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Tel : + 86 17733330123
Fax : 86-10-34242423-33
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